One of the companies from the semiconductor industry was implementing ERP solution to their business. Project team was testing the implementation with real-time business cases.
For front-end sites, photomask procurement process was not working as expected. War-room was set to check for any quick-fixes to resolve the issues or work-around possible to execute the process.
Can the system go-live functionally with acceptable bugs/ workarounds or without implementing business process? Project team decided to defer go-live date for front-end sites. So, what is photomask and why photomask process has so much importance?
Photomasks are used for optical lithography in silicon wafer processing and contain the pattern of the integrated circuits.
Optical lithography is a photographic process by which a light-sensitive polymer, called a photoresist, is exposed to light source, and developed to form 3D relief images on the substrate.
For understanding purpose, photomask is a kind of template which replicates chip circuit design. It is quartz or glass substrate coated with an opaque film.
Photomask is one of the main front-end manufacturing materials, along with materials like silicon wafers, gases, wet chemicals, photoresist.
In one of the papers submitted by semiconductor industry association in April 2021[2], they have given the breakdown of market size of semiconductor manufacturing materials.
As per data of 2019, photomask market share contributes to 12% of front-end materials
Photomask technology is always ahead of the semiconductor technology
In general, photomasks are ordered ‘Just in Time’. Photomasks are ordered in sets. One photomask set generally contains more than one photomask layer
Photomasks are unique in nature. This uniqueness makes ‘planning in advance’ difficult
Shortage of photomask has severe impact on front-end site operations, and theoretically can lead to shutdown of the front-end site in extreme cases
Each business process has unique KPIs. In case of photomask procurement, time criticality and data security are key areas to be focused.
Example – creating material master/ part master/ item master for each photomask is not a good idea considering uniqueness of photomask.
Various countries have already established data protection regulations to secure the data. Photomask designs can be considered as IPs of the organization. Any misuse/ leakage of the data can lead to business risks and financial losses.
During IT solution implementation, there is an inclination to store all the data at one place to ease the reporting and hence replication of data is preferred in case of multitenant IT implementations. The inclination should be avoided.
Digital technology is growing with lightning speed. Artificial Intelligence, Machine Learning, IoT are driving the world and are already part of day-to-day life.
Due to increasing applications, chip and photomask designs are changing and are getting more and more complex.
Considering the possibility of change in the number of attributes that describes the photomask, IT solution should be scalable and flexible enough to accommodate these changes in the photomask attributes.
Selection of ‘best fit’ system components helps to come out quickly from situations like system maintenance, system upgrades.
This is especially important for photomask underlining time criticality of the business process